CMP Polisher Platen Assembly from Mexico
Rotating platen holding polishing pad in chemical mechanical planarization tools for wafers. Integral part of 8425 polishers under 8431.10.0090. Composite construction for uniform pressure distribution.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.94.0525%Except for products described in headings 9903.94.06, 9903.94.32, 9903.94.33, 9903.94.42, 9903.94.43, 9903.94.44, 9903.94.45, 9903.94.52, 9903.94.53, 9903.94.54, 9903.94.55, 9903.94.62, 9903.94.63, 9903.94.66 and 9903.94.67, automobile parts, as provided for in subdivision (g) of U.S. note 33 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
9903.74.100%Articles as provided for in subdivision (k) of U.S. note 38 to this subchapter
9903.74.110%Articles as provided for in subdivision (l) of U.S. note 38 to this subchapter.
Import Tips
• Verify pad adhesion specs and rotation balance; document MRR performance
• Pitfall: plastic article under 3926 if material emphasized