Semiconductor Developer Spray Apparatus from Mexico
Spray system projecting alkaline developer solutions to selectively remove exposed photoresist from patterned wafers. HTS 8424.89.9000 covers such chemical liquid projecting appliances in semiconductor fabrication.
Duty Rate — Mexico → United States
15%
Rate breakdown
9903.82.1015%Except as provided for in headings 9903.82.12, 9903.82.17 and 9903.85.68, derivative aluminum and steel articles with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 15 percent, as provided for in subdivision (f) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include chemical compatibility certifications for wafer materials
• Document rinse water spray integration as single apparatus