Wafer Lapping Machine Polishing Pad from China
Abrasive polishing pads for wafer lappers and polishers that achieve flatness tolerances for semiconductor fabrication readiness. Falls under HTS 8422.90.91.95 per statistical notes for wafer preparation machinery parts. Ensures mirror-finish wafer surfaces critical for device processing.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Specify pad grit and flatness specs (<0.1 micron); use ESD-safe packaging; avoid bulk classification as generic abrasives