Semiconductor Polisher Air Particle Collector from Mexico
High-efficiency particulate air (HEPA) collector designed for chemical mechanical polishers that achieve mirror-flat wafer surfaces for device fabrication, capturing nano-scale slurry particles. HTS 8421.39.0115 applies as dust collection equipment for wafer preparation apparatus per chapter statistical notes. Enables defect-free semiconductor wafers for advanced nodes.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Tested filter specs (HEPA H14, 99.995% @ 0.1μm) required for duty preference
• Validate against specific CMP tool models