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8421.39.01.15/Semiconductor Polisher Air Particle Collector/Japan

Semiconductor Polisher Air Particle Collector from Japan

High-efficiency particulate air (HEPA) collector designed for chemical mechanical polishers that achieve mirror-flat wafer surfaces for device fabrication, capturing nano-scale slurry particles. HTS 8421.39.0115 applies as dust collection equipment for wafer preparation apparatus per chapter statistical notes. Enables defect-free semiconductor wafers for advanced nodes.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Tested filter specs (HEPA H14, 99.995% @ 0.1μm) required for duty preference

• Validate against specific CMP tool models

Semiconductor Polisher Air Particle Collector from Japan — Import Duty Rate | HTS 8421.39.01.15