Semiconductor Polisher Air Particle Collector from Germany
High-efficiency particulate air (HEPA) collector designed for chemical mechanical polishers that achieve mirror-flat wafer surfaces for device fabrication, capturing nano-scale slurry particles. HTS 8421.39.0115 applies as dust collection equipment for wafer preparation apparatus per chapter statistical notes. Enables defect-free semiconductor wafers for advanced nodes.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Tested filter specs (HEPA H14, 99.995% @ 0.1μm) required for duty preference
• Validate against specific CMP tool models