Semiconductor Polisher Air Particle Collector from Germany
High-efficiency particulate air (HEPA) collector designed for chemical mechanical polishers that achieve mirror-flat wafer surfaces for device fabrication, capturing nano-scale slurry particles. HTS 8421.39.0115 applies as dust collection equipment for wafer preparation apparatus per chapter statistical notes. Enables defect-free semiconductor wafers for advanced nodes.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Tested filter specs (HEPA H14, 99.995% @ 0.1μm) required for duty preference
• Validate against specific CMP tool models