8419.90.50.80/Float Zone Silicon Crystal Grower/Japan

Float Zone Silicon Crystal Grower from Japan

Float zone furnace apparatus for producing ultra-pure silicon crystals by zone melting, heating a narrow zone of polycrystalline silicon rod to melt and recrystallize. Used in semiconductor industry for high-resistivity wafers. Falls under 8419.90.50.80 for parts of temperature-treatment equipment in semiconductor processing.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Declare exact zone melting parameters and purity specs; include fab end-use statement; watch for dual-use export licensing under ECCN 3B001