Double-Sided Wafer Polisher from Germany
Chemical-mechanical planarization (CMP) polisher for simultaneous double-sided polishing of silicon wafers, maintaining precise temperature control of polishing pads and slurries. Prepares wafer surface for device fabrication. Fits 8419.90.50.80 as semiconductor processing part.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Specify pad pressure and slurry flow rates; provide cleanroom compatibility certs; declare endpoint detection systems