Wafer Polishing Machine from Japan
Chemical mechanical polishing (CMP) machines for semiconductor wafers use rotating pads and temperature-controlled slurries to achieve mirror-finish surfaces with atomic-level flatness required for lithography. Statistical note (a)(ii)(C) preparation equipment. Temperature process justifies HTS 8419.89.95.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include CMP-specific slurry chemistry and platen temperature specs in entry docs
• Distinguish from general polishers by wafer size (200mm/300mm) and nanometer precision
• Leverage statistical note language for favorable duty treatment