Epitaxial Reactor Temperature Controller from Mexico
Multi-zone temperature control systems for epitaxial reactors maintain precise gradients (e.g., 1000-1200°C) across susceptors during thin film deposition on semiconductor wafers. Critical for layer thickness uniformity. HTS 8419.89.95 for temperature treatment equipment.
Duty Rate — Mexico → United States
14.2%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Provide zone temperature profiles and wafer size specs for classification
• Distinguish from general industrial heaters under 8516
• Technical literature showing MOCVD/MBE integration essential