Epitaxial Reactor Temperature Controller from China
Multi-zone temperature control systems for epitaxial reactors maintain precise gradients (e.g., 1000-1200°C) across susceptors during thin film deposition on semiconductor wafers. Critical for layer thickness uniformity. HTS 8419.89.95 for temperature treatment equipment.
Duty Rate — China → United States
41.7%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
Import Tips
• Provide zone temperature profiles and wafer size specs for classification
• Distinguish from general industrial heaters under 8516
• Technical literature showing MOCVD/MBE integration essential