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Stress Relief Annealing Oven for Wafers from Mexico

Precision annealing furnace for relieving internal stresses in processed semiconductor wafers through controlled heating/cooling cycles. HTS 8419.89.95.85 for temperature treatment of other semiconductor materials post-processing.

Duty Rate — Mexico → United States

14.2%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico

Import Tips

Ramp rate and soak temperature profiles must show semiconductor-specific cycles

Wafer carrier compatibility documentation required

General annealing ovens classify under 8514 if furnace-type