High-Temperature Wafer Cleaner from Mexico
Megasonic cleaning station using heated chemical baths and temperature-controlled drying for semiconductor wafer surface preparation. Classified HTS 8419.89.95.85 for temperature-based treatment in wafer processing of other materials.
Duty Rate — Mexico → United States
14.2%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Chemical bath temperatures (60-80°C) and drying specs critical for classification
• Cleanroom compatibility certification recommended
• Room-temp cleaners may classify under 8421.19 spin dryers