High-Temperature Wafer Cleaner from Mexico
Megasonic cleaning station using heated chemical baths and temperature-controlled drying for semiconductor wafer surface preparation. Classified HTS 8419.89.95.85 for temperature-based treatment in wafer processing of other materials.
Duty Rate — Mexico → United States
14.2%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Chemical bath temperatures (60-80°C) and drying specs critical for classification
• Cleanroom compatibility certification recommended
• Room-temp cleaners may classify under 8421.19 spin dryers