8419.89.95.85/High-Temperature Wafer Cleaner/Japan

High-Temperature Wafer Cleaner from Japan

Megasonic cleaning station using heated chemical baths and temperature-controlled drying for semiconductor wafer surface preparation. Classified HTS 8419.89.95.85 for temperature-based treatment in wafer processing of other materials.

Duty Rate — Japan → United States

14.2%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter

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Import Tips

• Chemical bath temperatures (60-80°C) and drying specs critical for classification

• Cleanroom compatibility certification recommended

• Room-temp cleaners may classify under 8421.19 spin dryers