8419.89.95.85/High-Temperature Wafer Cleaner/Japan

High-Temperature Wafer Cleaner from Japan

Megasonic cleaning station using heated chemical baths and temperature-controlled drying for semiconductor wafer surface preparation. Classified HTS 8419.89.95.85 for temperature-based treatment in wafer processing of other materials.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Chemical bath temperatures (60-80°C) and drying specs critical for classification

• Cleanroom compatibility certification recommended

• Room-temp cleaners may classify under 8421.19 spin dryers