High-Temperature Wafer Cleaner from Germany
Megasonic cleaning station using heated chemical baths and temperature-controlled drying for semiconductor wafer surface preparation. Classified HTS 8419.89.95.85 for temperature-based treatment in wafer processing of other materials.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Chemical bath temperatures (60-80°C) and drying specs critical for classification
• Cleanroom compatibility certification recommended
• Room-temp cleaners may classify under 8421.19 spin dryers