Double-Sided Wafer Lapper from Japan
Simultaneous double-sided lapping equipment for semiconductor wafers achieving sub-micron thickness uniformity through synchronized temperature-controlled platens. Classified under HTS 8419.89.95.85 for advanced wafer preparation on other materials.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Thickness uniformity specs (±0.1μm) essential for semiconductor classification
• Demonstrate independent platen temperature controls
• Risk of 8428.19 classification as other continuous-action elevators if misdescribed