Photoresist Coat Track Chiller from Japan
Chiller unit for photoresist coating track modules, maintaining developer and rinse temperatures during wafer photolithography preparation. 8419.89.9540 for semiconductor process cooling excluding domestic equipment. Ensures critical dimension control.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include photoresist viscosity-temperature charts and track tool interface
• Prove process material treatment vs general lab cooling