Photoresist Coat Track Chiller from China
Chiller unit for photoresist coating track modules, maintaining developer and rinse temperatures during wafer photolithography preparation. 8419.89.9540 for semiconductor process cooling excluding domestic equipment. Ensures critical dimension control.
Duty Rate — China → United States
41.7%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0225%Except as provided in headings 9903.88.12, 9903.88.17, 9903.88.20, 9903.88.54, 9903.88.59, 9903.88.61, 9903.88.63, 9903.88.66, 9903.88.67, 9903.88.68, 9903.88.69, or 9903.88.70, articles the product of China, as provided for in U.S. note 20(c) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(d)
Import Tips
• Include photoresist viscosity-temperature charts and track tool interface
• Prove process material treatment vs general lab cooling