Pre-Diffusion Bake Oven from Japan
Precision bake oven that drives off solvents from photoresist prior to diffusion furnace processing using ramped temperature profiles. HTS 8419.39.02 as industrial dryer for semiconductor wafer preparation.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document temperature ramp rates and uniformity specs
• Specify photoresist thickness range supported
• Include nitrogen purge system details