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Pre-Diffusion Bake Oven from Japan

Precision bake oven that drives off solvents from photoresist prior to diffusion furnace processing using ramped temperature profiles. HTS 8419.39.02 as industrial dryer for semiconductor wafer preparation.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Document temperature ramp rates and uniformity specs

Specify photoresist thickness range supported

Include nitrogen purge system details