Pre-Diffusion Bake Oven from Japan
Precision bake oven that drives off solvents from photoresist prior to diffusion furnace processing using ramped temperature profiles. HTS 8419.39.02 as industrial dryer for semiconductor wafer preparation.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document temperature ramp rates and uniformity specs
• Specify photoresist thickness range supported
• Include nitrogen purge system details