Photoresist Strip Dryer from Mexico
Inline dryer following photoresist ash/strip process that uses heated clean dry air to remove residual solvents from wafer surfaces before next processing step. Classified HTS 8419.39.02 for semiconductor manufacturing dryers.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide ash chemistry compatibility documentation
• Specify wafer carrier type (FOUP, cassette)
• Include particle performance specs (<0.1 per cm²)