Photoresist Strip Dryer from Mexico
Inline dryer following photoresist ash/strip process that uses heated clean dry air to remove residual solvents from wafer surfaces before next processing step. Classified HTS 8419.39.02 for semiconductor manufacturing dryers.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Provide ash chemistry compatibility documentation
• Specify wafer carrier type (FOUP, cassette)
• Include particle performance specs (<0.1 per cm²)