Photoresist Strip Dryer from Japan
Inline dryer following photoresist ash/strip process that uses heated clean dry air to remove residual solvents from wafer surfaces before next processing step. Classified HTS 8419.39.02 for semiconductor manufacturing dryers.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide ash chemistry compatibility documentation
• Specify wafer carrier type (FOUP, cassette)
• Include particle performance specs (<0.1 per cm²)