Photoresist Strip Dryer from Japan
Inline dryer following photoresist ash/strip process that uses heated clean dry air to remove residual solvents from wafer surfaces before next processing step. Classified HTS 8419.39.02 for semiconductor manufacturing dryers.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide ash chemistry compatibility documentation
• Specify wafer carrier type (FOUP, cassette)
• Include particle performance specs (<0.1 per cm²)