Float Zone Crystal Furnace from Japan
Industrial furnace employing float zone method to purify and grow semiconductor crystals through zone melting with RF heating and controlled cooling. Classified in 8419.39.02 for its drying and vaporizing processes during material treatment in semiconductor boule production.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document RF heating specifications to confirm temperature treatment classification
• Include process flow diagrams showing material drying/evaporation steps
• Check for dual-use export controls on high-purity crystal growth equipment