CMP Wafer Dryer from China
Chemical Mechanical Polishing post-process dryer using heated isopropyl alcohol vapor to dry wafers without leaving watermarks, critical for yield in advanced nodes. Classified in HTS Marplane39.02 for semiconductor-specific drying with temperature control.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Specify chemical compatibility (IPA, SC1, etc.) for proper documentation
• Include defectivity reduction data to justify specialized classification
• Check hazardous material handling certifications for solvents