8419.39.02.80/Wafer Lapping Machine/Japan

Wafer Lapping Machine from Japan

Industrial machine that laps semiconductor wafers to precise flatness using slurries and temperature-controlled platens for surface preparation. HTS 8419.39.0280 applies due to cooling and drying in the lapping process for wafer fabrication readiness. Ensures dimensional tolerances for chip processing.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Provide evidence of slurry cooling systems to support temperature change classification

• Use ISPM-15 compliant wood packaging for large machinery shipments