Gallium Arsenide Wafer Cooler from Mexico
Precision cooling station for GaAs wafers after high-temp epitaxy, using cryogenic or thermoelectric cooling to stabilize lattice structures. HTS 8419.39.0280 covers cooling processes in material treatment for semiconductors. Prevents thermal defects in compound semiconductor production.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify material (GaAs) and cooling method in entry docs for accurate duty
• Hazardous material declarations if using cryogens