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8419.39.02.80/Gallium Arsenide Wafer Cooler/Japan

Gallium Arsenide Wafer Cooler from Japan

Precision cooling station for GaAs wafers after high-temp epitaxy, using cryogenic or thermoelectric cooling to stabilize lattice structures. HTS 8419.39.0280 covers cooling processes in material treatment for semiconductors. Prevents thermal defects in compound semiconductor production.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Specify material (GaAs) and cooling method in entry docs for accurate duty

• Hazardous material declarations if using cryogens