Semiconductor Diffusion Furnace from Japan
Nonelectric industrial furnace for dopant diffusion into semiconductor wafers creating device junctions, using gas phase reactions in horizontal or vertical quartz tubes. Essential for bipolar and MOS device fabrication. Falls under 8417.80.00.00 as nonelectric furnace for semiconductor processing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Certify quartz tube construction and gas flow systems as nonelectric heating; include dopant compatibility documentation
• Common error: classifying tube boats as separate parts excluded from this subheading