Semiconductor Diffusion Furnace from Germany
Nonelectric industrial furnace for dopant diffusion into semiconductor wafers creating device junctions, using gas phase reactions in horizontal or vertical quartz tubes. Essential for bipolar and MOS device fabrication. Falls under 8417.80.00.00 as nonelectric furnace for semiconductor processing.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Certify quartz tube construction and gas flow systems as nonelectric heating; include dopant compatibility documentation
• Common error: classifying tube boats as separate parts excluded from this subheading