CMP Wafer Polisher Slurry Feed Compressor Diaphragm from Mexico
Corrosion-resistant diaphragm for hermetic compressors delivering polishing slurry to chemical mechanical planarization (CMP) pads on wafer polishers. Ensures contamination-free delivery at precise pressures. Classified under 8414.90.41.55 for semiconductor wafer finishing compressors.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Specify chemical resistance to CMP slurries (silica, ceria, etc.)
• Include pressure pulsation specs for uniform polishing
• Distinguish from 3917 plastic diaphragms by compressor function