CMP Wafer Polisher Slurry Feed Compressor Diaphragm from China
Corrosion-resistant diaphragm for hermetic compressors delivering polishing slurry to chemical mechanical planarization (CMP) pads on wafer polishers. Ensures contamination-free delivery at precise pressures. Classified under 8414.90.41.55 for semiconductor wafer finishing compressors.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Specify chemical resistance to CMP slurries (silica, ceria, etc.)
• Include pressure pulsation specs for uniform polishing
• Distinguish from 3917 plastic diaphragms by compressor function