CMP Wafer Polisher Slurry Feed Compressor Diaphragm from Canada
Corrosion-resistant diaphragm for hermetic compressors delivering polishing slurry to chemical mechanical planarization (CMP) pads on wafer polishers. Ensures contamination-free delivery at precise pressures. Classified under 8414.90.41.55 for semiconductor wafer finishing compressors.
Duty Rate — Canada → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Specify chemical resistance to CMP slurries (silica, ceria, etc.)
• Include pressure pulsation specs for uniform polishing
• Distinguish from 3917 plastic diaphragms by compressor function