Wafer Cleaning Vacuum Dryer from Japan
Marangoni vacuum drying station using IPA vapor and vacuum extraction for megasonic cleaned semiconductor wafers achieving <10nm watermarks. Classified under 8414.80.90.00 for the vacuum drying critical to wafer cleanliness.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document watermark performance and megasonic frequency specs
• Include N2 flow rates and vacuum levels for IPA extraction
• Provide cleanroom compatibility certification (Class 1)