Wafer Cleaning Vacuum Dryer from Japan
Marangoni vacuum drying station using IPA vapor and vacuum extraction for megasonic cleaned semiconductor wafers achieving <10nm watermarks. Classified under 8414.80.90.00 for the vacuum drying critical to wafer cleanliness.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document watermark performance and megasonic frequency specs
• Include N2 flow rates and vacuum levels for IPA extraction
• Provide cleanroom compatibility certification (Class 1)