RTP Vacuum Pump Module from Mexico
Vacuum pump package for Rapid Thermal Processing chambers used in semiconductor annealing and dopant activation at 1000+°C. Falls under 8414.80.90.00 for specialized gas evacuation maintaining process vacuum levels.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Specify temperature compatibility (up to 1200°C) and vacuum levels
• Include ramp rate specifications (50°C/sec minimum)
• Document compatibility with NH3, H2 process gases