RTP Vacuum Pump Module from Japan
Vacuum pump package for Rapid Thermal Processing chambers used in semiconductor annealing and dopant activation at 1000+°C. Falls under 8414.80.90.00 for specialized gas evacuation maintaining process vacuum levels.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Specify temperature compatibility (up to 1200°C) and vacuum levels
• Include ramp rate specifications (50°C/sec minimum)
• Document compatibility with NH3, H2 process gases