RTP Vacuum Pump Module from Japan
Vacuum pump package for Rapid Thermal Processing chambers used in semiconductor annealing and dopant activation at 1000+°C. Falls under 8414.80.90.00 for specialized gas evacuation maintaining process vacuum levels.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify temperature compatibility (up to 1200°C) and vacuum levels
• Include ramp rate specifications (50°C/sec minimum)
• Document compatibility with NH3, H2 process gases