PECVD Vacuum Foreline Pump from Mexico
Dry roughing pump for PECVD (Plasma Enhanced Chemical Vapor Deposition) systems handling corrosive precursor gases in thin film deposition. HTS 8414.80.90.00 covers semiconductor-specific vacuum pumping with chemical resistance.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Specify chemical compatibility (TEOS, NH3, SiH4) in material certs
• Document dry pump technology vs. wet pump alternatives
• Include particle generation rate data (<0.05 particles/cm³)