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8414.80.90.00/PECVD Vacuum Foreline Pump/Japan

PECVD Vacuum Foreline Pump from Japan

Dry roughing pump for PECVD (Plasma Enhanced Chemical Vapor Deposition) systems handling corrosive precursor gases in thin film deposition. HTS 8414.80.90.00 covers semiconductor-specific vacuum pumping with chemical resistance.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Specify chemical compatibility (TEOS, NH3, SiH4) in material certs

• Document dry pump technology vs. wet pump alternatives

• Include particle generation rate data (<0.05 particles/cm³)

PECVD Vacuum Foreline Pump from Japan — Import Duty Rate | HTS 8414.80.90.00