PECVD Vacuum Foreline Pump from Germany
Dry roughing pump for PECVD (Plasma Enhanced Chemical Vapor Deposition) systems handling corrosive precursor gases in thin film deposition. HTS 8414.80.90.00 covers semiconductor-specific vacuum pumping with chemical resistance.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify chemical compatibility (TEOS, NH3, SiH4) in material certs
• Document dry pump technology vs. wet pump alternatives
• Include particle generation rate data (<0.05 particles/cm³)