Ion Implanter Vacuum Pump from Japan
Cryopump system designed for ion implanter chambers achieving UHV levels (<10^-9 Torr) for semiconductor dopant implantation. Classified 8414.80.90.00 as specialized vacuum pump for semiconductor device fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document ultimate vacuum specs and ion species compatibility
• Include beam line pressure requirements in technical specs
• Comply with radiation safety certifications for implanter use