Ion Implanter Vacuum Pump from Japan
Cryopump system designed for ion implanter chambers achieving UHV levels (<10^-9 Torr) for semiconductor dopant implantation. Classified 8414.80.90.00 as specialized vacuum pump for semiconductor device fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document ultimate vacuum specs and ion species compatibility
• Include beam line pressure requirements in technical specs
• Comply with radiation safety certifications for implanter use