Ion Implanter Vacuum Pump from Germany
Cryopump system designed for ion implanter chambers achieving UHV levels (<10^-9 Torr) for semiconductor dopant implantation. Classified 8414.80.90.00 as specialized vacuum pump for semiconductor device fabrication.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Document ultimate vacuum specs and ion species compatibility
• Include beam line pressure requirements in technical specs
• Comply with radiation safety certifications for implanter use