Epitaxial Vacuum Pump Skid from Mexico
Integrated pump package (roughing + high vacuum) for MOCVD epitaxial reactors growing compound semiconductor layers (GaAs, InP). HTS 8414.80.90.00 for semiconductor epitaxy vacuum requirements.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify precursor compatibility (TMGa, TMAl) and growth pressures
• Document hydride safety system integration
• Include wafer size range (2-8 inch capability)