Spin Coating Photoresist Pump from Mexico
Low-flow pump dispensing photoresist onto spinning semiconductor wafers for uniform thin film coating in lithography. Controls dispense profile for critical dimensions. HTS 8413.81.00 other precision liquid pumps.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include spin speed vs flow rate curves proving lithography application
• Certify dispense nozzle materials for photoresist solvent resistance
• Describe as 'track photoresist dispense pump' specifically