Spin Coating Photoresist Pump from Japan
Low-flow pump dispensing photoresist onto spinning semiconductor wafers for uniform thin film coating in lithography. Controls dispense profile for critical dimensions. HTS 8413.81.00 other precision liquid pumps.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include spin speed vs flow rate curves proving lithography application
• Certify dispense nozzle materials for photoresist solvent resistance
• Describe as 'track photoresist dispense pump' specifically