Spin Coating Photoresist Pump from Japan
Low-flow pump dispensing photoresist onto spinning semiconductor wafers for uniform thin film coating in lithography. Controls dispense profile for critical dimensions. HTS 8413.81.00 other precision liquid pumps.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Include spin speed vs flow rate curves proving lithography application
• Certify dispense nozzle materials for photoresist solvent resistance
• Describe as 'track photoresist dispense pump' specifically