Silicon Wafer Polishing Slurry Pump from Germany
Specialized pump circulating colloidal silica slurries for chemical-mechanical polishing (CMP) of semiconductor wafers to mirror finish required for fabrication. Critical for final surface preparation per statistical notes. Under HTS 8413.81.00 as other CMP liquid pumps.
Duty Rate — Germany → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include CMP slurry MSDS and pump wetted materials certification for classification
• Demonstrate removal rate and planarization specs tying to wafer fab standards
• Prevent reclassification by specifying 'CMP slurry recirculation pump' distinctly