Rinse Water Recirculation Pump for Wafer Cleaning from Mexico
High-flow pump for deionized water recirculation in post-etch wafer cleaning stations, critical for particle removal before inspection. Supports semiconductor device yield. HTS 8413.81.00 other pumps for wafer processing liquids.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Specify resistivity requirements (>18 MΩ-cm) proving semiconductor DI water use
• Include particle count reduction data from cleaning process validation
• Avoid 'water pump' description; emphasize 'wafer megasonic cleaning pump'