Rinse Water Recirculation Pump for Wafer Cleaning from China
High-flow pump for deionized water recirculation in post-etch wafer cleaning stations, critical for particle removal before inspection. Supports semiconductor device yield. HTS 8413.81.00 other pumps for wafer processing liquids.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Specify resistivity requirements (>18 MΩ-cm) proving semiconductor DI water use
• Include particle count reduction data from cleaning process validation
• Avoid 'water pump' description; emphasize 'wafer megasonic cleaning pump'