Rinse Water Recirculation Pump for Wafer Cleaning from Canada
High-flow pump for deionized water recirculation in post-etch wafer cleaning stations, critical for particle removal before inspection. Supports semiconductor device yield. HTS 8413.81.00 other pumps for wafer processing liquids.
Duty Rate — Canada → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Specify resistivity requirements (>18 MΩ-cm) proving semiconductor DI water use
• Include particle count reduction data from cleaning process validation
• Avoid 'water pump' description; emphasize 'wafer megasonic cleaning pump'