Photoresist Developer Liquid Pump from Mexico
Precision pump for alkaline developer solutions in semiconductor wafer photolithography processing. Delivers exact flow rates for pattern development after exposure. HTS 8413.81.00 for other liquid pumps in device fabrication.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter
Import Tips
• Reference specific photoresist chemistries and track widths supported by pump precision
• Provide cleanroom particle generation data proving semiconductor compatibility
• Use detailed lithography process description in commercial invoices