Hydrofluoric Acid Etch Pump from Mexico
Corrosion-resistant pump for HF etching solutions used to clean and pattern semiconductor wafers during device fabrication. Handles highly aggressive acids safely. Classified HTS 8413.81.00 as other pumps for semiconductor liquid processing.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Include wetted materials certification (PTFE/PFA) for HF compatibility
• Document etch rate uniformity specs linking to semiconductor oxide removal
• Declare as 'semiconductor wet etch pump' with safety data sheets