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Epitaxial Reactor Precursor Delivery Pump from Mexico

Metering pump for hydride and metalorganic precursors in MOCVD epitaxial reactors growing compound semiconductor layers on wafers. Ensures layer uniformity. Under HTS 8413.81.00 for semiconductor liquid pumps.

Duty Rate — Mexico → United States

25%

Rate breakdown

9903.82.0925%Except as provided for in headings 9903.82.16 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) of U.S. note 16 to this subchapter
9903.03.060%Articles of aluminum, of steel, or of copper or derivative aluminum or steel articles; passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; parts of passenger vehicles (sedans, sport utility vehicles, crossover utility vehicles, minivans, and cargo vans) and light trucks; medium- and heavy-duty vehicles; parts of medium- and heavy-duty vehicles; wood products; and semiconductor articles, of any country, as provided in subdivision (aa)(v) of U.S. note 2 to this subchapter

Import Tips

Provide bubbler system diagrams showing liquid precursor vaporization role

Document precursor flow precision to ±0.1 sccm for classification support

Specify GaAs/SiC epi applications in end-use statements