Epitaxial Reactor Precursor Delivery Pump from Japan
Metering pump for hydride and metalorganic precursors in MOCVD epitaxial reactors growing compound semiconductor layers on wafers. Ensures layer uniformity. Under HTS 8413.81.00 for semiconductor liquid pumps.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide bubbler system diagrams showing liquid precursor vaporization role
• Document precursor flow precision to ±0.1 sccm for classification support
• Specify GaAs/SiC epi applications in end-use statements